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Nickel-based target material and preparation method and application thereof
The invention relates to the field of ceramic target materials, and particularly relates to a nickel-based target material and a preparation method and application thereof. The Nd<1-x>AxNiO3 ceramic target material which is pure in component, uniform in element and density distribution and good in mechanical strength, hardness and density is prepared through a production process of ball-milling, presintering, secondary ball-milling, granulation, blank making, rubber discharging, programmed temperature rising and sintering and programmed cooling, a Nd<1-x>AxNiO3 film can be obtained through magnetron sputtering growth of the Nd<1-x>AxNiO3 ceramic target material, and the film has good crystallinity and high-quality single crystal epitaxy property. In addition, the invention further providesthe Nd<1-x>AxNiO2 film, and the Nd<1-x>AxNiO2 film has excellent superconducting characteristics and electrical transport properties.
本发明涉及陶瓷靶材领域，特别是涉及一种镍基靶材及其制备方法和应用。通过球磨‑预烧‑二次球磨‑造粒‑制坯‑排胶‑程序式升温烧结‑程序式降温的生产工艺，制备得到了成分纯净，元素和密度分布均匀，且具有良好的机械强度、硬度和致密度的Nd1‑xAxNiO3陶瓷靶材，将其进行磁控溅射生长可得到Nd1‑xAxNiO3薄膜，该薄膜具有良好的结晶度和高质量的单晶外延性质；此外，本发明还提供了一种Nd1‑xAxNiO2薄膜，其具有优良的超导特性和电输运性质。
Nickel-based target material and preparation method and application thereof
The invention relates to the field of ceramic target materials, and particularly relates to a nickel-based target material and a preparation method and application thereof. The Nd<1-x>AxNiO3 ceramic target material which is pure in component, uniform in element and density distribution and good in mechanical strength, hardness and density is prepared through a production process of ball-milling, presintering, secondary ball-milling, granulation, blank making, rubber discharging, programmed temperature rising and sintering and programmed cooling, a Nd<1-x>AxNiO3 film can be obtained through magnetron sputtering growth of the Nd<1-x>AxNiO3 ceramic target material, and the film has good crystallinity and high-quality single crystal epitaxy property. In addition, the invention further providesthe Nd<1-x>AxNiO2 film, and the Nd<1-x>AxNiO2 film has excellent superconducting characteristics and electrical transport properties.
本发明涉及陶瓷靶材领域，特别是涉及一种镍基靶材及其制备方法和应用。通过球磨‑预烧‑二次球磨‑造粒‑制坯‑排胶‑程序式升温烧结‑程序式降温的生产工艺，制备得到了成分纯净，元素和密度分布均匀，且具有良好的机械强度、硬度和致密度的Nd1‑xAxNiO3陶瓷靶材，将其进行磁控溅射生长可得到Nd1‑xAxNiO3薄膜，该薄膜具有良好的结晶度和高质量的单晶外延性质；此外，本发明还提供了一种Nd1‑xAxNiO2薄膜，其具有优良的超导特性和电输运性质。
Nickel-based target material and preparation method and application thereof
镍基靶材及其制备方法和应用
PEI YUJUAN (author) / CAO YANWEI (author) / ZHANG RUYI (author) / PENG SHAOQIN (author) / SONG YANG (author)
2021-03-12
Patent
Electronic Resource
Chinese
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