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CONTROLLED POROSITY YTTRIUM OXIDE FOR ETCH APPLICATIONS
A sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, wherein the sintered yttrium oxide body has at least one surface comprising at least one pore, wherein no pore is larger than 5 [mu]m in diameter. A process for making the sintered yttrium oxide body is also disclosed.
一种烧结氧化钇体,其具有40ppm或更少的总杂质水平、不小于4.93g/cm3的密度,其中所述烧结氧化钇体具有包含至少一个孔的至少一个表面,其中没有直径大于5μm的孔。还公开了一种制备所述烧结氧化钇体的方法。
CONTROLLED POROSITY YTTRIUM OXIDE FOR ETCH APPLICATIONS
A sintered yttrium oxide body having a total impurity level of 40 ppm or less, a density of not less than 4.93 g/cm3, wherein the sintered yttrium oxide body has at least one surface comprising at least one pore, wherein no pore is larger than 5 [mu]m in diameter. A process for making the sintered yttrium oxide body is also disclosed.
一种烧结氧化钇体,其具有40ppm或更少的总杂质水平、不小于4.93g/cm3的密度,其中所述烧结氧化钇体具有包含至少一个孔的至少一个表面,其中没有直径大于5μm的孔。还公开了一种制备所述烧结氧化钇体的方法。
CONTROLLED POROSITY YTTRIUM OXIDE FOR ETCH APPLICATIONS
用于蚀刻应用的受控孔隙率氧化钇
DONELON MATTHEW J (author) / BISTA SAURAV (author) / WAGHMARE SAURABH (author) / DAVIS CHASE (author) / WEISSMAYER MICHAEL (author) / FRANZ FELIX (author)
2021-12-14
Patent
Electronic Resource
Chinese
IPC:
C04B
Kalk
,
LIME
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