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Zinc-doped indium oxide powder, sputtering target material and preparation method thereof
The invention provides zinc-doped indium oxide powder, a sputtering target material and a preparation method thereof, and belongs to the technical field of new materials. The precursor powder of the zinc-doped indium oxide is synthesized in one step by adopting a hydrothermal method, the reaction system is stable, and the obtained zinc-doped indium oxide powder is high in purity, uniform in crystal form distribution, good in dispersity and high in crystallinity; the sputtering target material obtained after the powder is sintered is small in grain size, uniform in distribution and high in density. The whole process from powder preparation to forming and sintering is simple and convenient, low in cost and suitable for industrial production.
本发明提供了一种锌掺杂氧化铟粉体、溅射靶材及其制备方法，属于新材料技术领域。本发明采用水热法一步合成了锌掺杂氧化铟的前驱体粉末，反应体系稳定，所得锌掺杂氧化铟粉体纯度高、晶型分布均匀，分散性好、结晶度高；该粉体烧结后所得溅射靶材晶粒尺寸细小、分布均匀、致密度高。本申请从粉体的制备，到成形及烧结工艺，整个流程简便，成本低，适于工业化生产。
Zinc-doped indium oxide powder, sputtering target material and preparation method thereof
The invention provides zinc-doped indium oxide powder, a sputtering target material and a preparation method thereof, and belongs to the technical field of new materials. The precursor powder of the zinc-doped indium oxide is synthesized in one step by adopting a hydrothermal method, the reaction system is stable, and the obtained zinc-doped indium oxide powder is high in purity, uniform in crystal form distribution, good in dispersity and high in crystallinity; the sputtering target material obtained after the powder is sintered is small in grain size, uniform in distribution and high in density. The whole process from powder preparation to forming and sintering is simple and convenient, low in cost and suitable for industrial production.
本发明提供了一种锌掺杂氧化铟粉体、溅射靶材及其制备方法，属于新材料技术领域。本发明采用水热法一步合成了锌掺杂氧化铟的前驱体粉末，反应体系稳定，所得锌掺杂氧化铟粉体纯度高、晶型分布均匀，分散性好、结晶度高；该粉体烧结后所得溅射靶材晶粒尺寸细小、分布均匀、致密度高。本申请从粉体的制备，到成形及烧结工艺，整个流程简便，成本低，适于工业化生产。
Zinc-doped indium oxide powder, sputtering target material and preparation method thereof
一种锌掺杂氧化铟粉体、溅射靶材及其制备方法
LIU YANG (author) / SUN BENSHUANG (author) / ZENG XUEYUN (author) / LIU CHAOFEI (author) / LIU XIAOKAI (author) / WANG ZHIJUN (author) / LIU MIAO (author) / CHEN JIE (author) / SHU YONGCHUN (author) / HE JILIN (author)
2022-01-21
Patent
Electronic Resource
Chinese
ZINC-DOPED INDIUM OXIDE POWDER, SPUTTERING TARGET MATERIAL, AND PREPARATION METHODS THEREFOR
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