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Indium tantalum yttrium oxide powder and preparation method thereof
The invention discloses indium tantalum yttrium oxide powder and a preparation method thereof, and belongs to the field of preparation of indium tantalum yttrium oxide. The chemical formula of the indium tantalum yttrium oxide is In < 1-x-y > Ta < x > Y < y > O, the value of x ranges from 0.001 to 0.1, and the value of y ranges from 0.001 to 0.2. According to the powder, D50 is equal to 0.421-0.452 mu m, D10 is larger than or equal to 0.209 mu m, D90 is smaller than or equal to 0.638 mu m, and the particle size distribution coefficient P is equal to (D90-D10)/D50 smaller than or equal to 0.902. According to the indium tantalum yttrium oxide powder and the preparation method thereof, starting from the prior art, the problem that components are not uniform when indium oxide powder is doped with large-particle-size rare metal elements is solved, the indium tantalum yttrium oxide powder with the uniform components can be prepared through the method, and in practical application, the indium tantalum yttrium oxide powder has the advantages that the preparation method is simple, and the cost is low. The indium tantalum yttrium oxide powder is combined with a subsequent sintering process to prepare a high-density indium tantalum yttrium oxide target material with a uniform structure and excellent photoelectric characteristics.
本发明公开了一种氧化铟钽钇粉体及其制备方法，属于铟钽钇氧化物的制备领域。所述氧化铟钽钇的化学式为In1‑x‑yTaxYyO，其中，x值在0.001‑0.1之间，y值在0.001‑0.2之间。所述粉体的D50＝0.421‑0.452μm，D10≥0.209μm，D90≤0.638μm，粒度分布系数P＝(D90‑D10)/D50≤0.902。本发明从现有技术出发，针对氧化铟粉体掺杂大粒径稀有金属元素时出现的成分不均一的问题，提供一种氧化铟钽钇粉体及其制备方法，采用该方法可以制备出成分均一的氧化铟钽钇粉体，在实际应用中，利用该氧化铟钽钇粉体结合后续烧结工艺可以制备出组织均匀、具备优良光电特性的高密度氧化铟钽钇靶材。
Indium tantalum yttrium oxide powder and preparation method thereof
The invention discloses indium tantalum yttrium oxide powder and a preparation method thereof, and belongs to the field of preparation of indium tantalum yttrium oxide. The chemical formula of the indium tantalum yttrium oxide is In < 1-x-y > Ta < x > Y < y > O, the value of x ranges from 0.001 to 0.1, and the value of y ranges from 0.001 to 0.2. According to the powder, D50 is equal to 0.421-0.452 mu m, D10 is larger than or equal to 0.209 mu m, D90 is smaller than or equal to 0.638 mu m, and the particle size distribution coefficient P is equal to (D90-D10)/D50 smaller than or equal to 0.902. According to the indium tantalum yttrium oxide powder and the preparation method thereof, starting from the prior art, the problem that components are not uniform when indium oxide powder is doped with large-particle-size rare metal elements is solved, the indium tantalum yttrium oxide powder with the uniform components can be prepared through the method, and in practical application, the indium tantalum yttrium oxide powder has the advantages that the preparation method is simple, and the cost is low. The indium tantalum yttrium oxide powder is combined with a subsequent sintering process to prepare a high-density indium tantalum yttrium oxide target material with a uniform structure and excellent photoelectric characteristics.
本发明公开了一种氧化铟钽钇粉体及其制备方法，属于铟钽钇氧化物的制备领域。所述氧化铟钽钇的化学式为In1‑x‑yTaxYyO，其中，x值在0.001‑0.1之间，y值在0.001‑0.2之间。所述粉体的D50＝0.421‑0.452μm，D10≥0.209μm，D90≤0.638μm，粒度分布系数P＝(D90‑D10)/D50≤0.902。本发明从现有技术出发，针对氧化铟粉体掺杂大粒径稀有金属元素时出现的成分不均一的问题，提供一种氧化铟钽钇粉体及其制备方法，采用该方法可以制备出成分均一的氧化铟钽钇粉体，在实际应用中，利用该氧化铟钽钇粉体结合后续烧结工艺可以制备出组织均匀、具备优良光电特性的高密度氧化铟钽钇靶材。
Indium tantalum yttrium oxide powder and preparation method thereof
一种氧化铟钽钇粉体及其制备方法
ZHOU MING (author) / SHAO XUELIANG (author) / LI KAIJIE (author) / ZHANG LAIWEN (author)
2022-03-11
Patent
Electronic Resource
Chinese
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