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Gallium nitride particles and method for producing same
Provided are high-purity gallium nitride particles which have a low oxygen content and are suitable for use in raw materials and sintered bodies. Gallium nitride particles are used which are characterized by having an oxygen content of 0.5 atomic% or less and a total impurity amount of Si, Ge, Sn, Pb, Be, Mg, Ca, Sr, Ba, Zn, and Cd of less than 10 wtppm.
提供一种适合用于原料、烧结体的氧含量少且高纯度的氮化镓颗粒。使用一种氮化镓颗粒，其特征在于，氧含量为0.5原子％以下，Si、Ge、Sn、Pb、Be、Mg、Ca、Sr、Ba、Zn、Cd的元素的总杂质量低于10wtppm。
Gallium nitride particles and method for producing same
Provided are high-purity gallium nitride particles which have a low oxygen content and are suitable for use in raw materials and sintered bodies. Gallium nitride particles are used which are characterized by having an oxygen content of 0.5 atomic% or less and a total impurity amount of Si, Ge, Sn, Pb, Be, Mg, Ca, Sr, Ba, Zn, and Cd of less than 10 wtppm.
提供一种适合用于原料、烧结体的氧含量少且高纯度的氮化镓颗粒。使用一种氮化镓颗粒，其特征在于，氧含量为0.5原子％以下，Si、Ge、Sn、Pb、Be、Mg、Ca、Sr、Ba、Zn、Cd的元素的总杂质量低于10wtppm。
Gallium nitride particles and method for producing same
氮化镓颗粒和其制造方法
MESUDA MASAMI (author) / KURAMOCHI HIDETO (author) / HARA SHINICHI (author)
2022-05-17
Patent
Electronic Resource
Chinese
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