A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Ultrapure water supply apparatus, substrate processing system, and substrate processing method
The invention provides an ultrapure water supply apparatus, a substrate processing system, and a substrate processing method. The ultrapure water supply apparatus includes: a first supply device for producing first ultrapure water; a second supply device for producing second ultrapure water; the first standby supply device is used for supplying a part of the fluid in the first supply device to the second supply device; and a second backup supply device providing a portion of the fluid in the second supply device to the first supply device. The first supply device includes a first front filter member, a first rear filter member, and a first connection member. The second supply device includes a second front filter member, a second rear filter member, and a second connection member. Each of the first backup supply device and the second backup supply device connects the first connection member and the second connection member to each other.
提供了超纯水供应设备、基板处理系统和基板处理方法。超纯水供应设备包括：第一供应装置，生产第一超纯水；第二供应装置，生产第二超纯水；第一备用供应装置，向所述第二供应装置提供所述第一供应装置中的流体的一部分；以及第二备用供应装置，向所述第一供应装置提供所述第二供应装置中的流体的一部分。所述第一供应装置包括第一前侧过滤部件、第一后侧过滤部件和第一连接部件。所述第二供应装置包括第二前侧过滤部件、第二后侧过滤部件和第二连接部件。所述第一备用供应装置和所述第二备用供应装置中的每一者将所述第一连接部件和所述第二连接部件彼此连接。
Ultrapure water supply apparatus, substrate processing system, and substrate processing method
The invention provides an ultrapure water supply apparatus, a substrate processing system, and a substrate processing method. The ultrapure water supply apparatus includes: a first supply device for producing first ultrapure water; a second supply device for producing second ultrapure water; the first standby supply device is used for supplying a part of the fluid in the first supply device to the second supply device; and a second backup supply device providing a portion of the fluid in the second supply device to the first supply device. The first supply device includes a first front filter member, a first rear filter member, and a first connection member. The second supply device includes a second front filter member, a second rear filter member, and a second connection member. Each of the first backup supply device and the second backup supply device connects the first connection member and the second connection member to each other.
提供了超纯水供应设备、基板处理系统和基板处理方法。超纯水供应设备包括：第一供应装置，生产第一超纯水；第二供应装置，生产第二超纯水；第一备用供应装置，向所述第二供应装置提供所述第一供应装置中的流体的一部分；以及第二备用供应装置，向所述第一供应装置提供所述第二供应装置中的流体的一部分。所述第一供应装置包括第一前侧过滤部件、第一后侧过滤部件和第一连接部件。所述第二供应装置包括第二前侧过滤部件、第二后侧过滤部件和第二连接部件。所述第一备用供应装置和所述第二备用供应装置中的每一者将所述第一连接部件和所述第二连接部件彼此连接。
Ultrapure water supply apparatus, substrate processing system, and substrate processing method
超纯水供应设备、基板处理系统和基板处理方法
YOON JONG-HA (author) / KIM SEYOON (author) / PARK JU-HEE (author) / LEE JI-YEON (author) / SHIN CHEOL-MIN (author)
2023-09-22
Patent
Electronic Resource
Chinese
IPC:
C02F
Behandlung von Wasser, Schmutzwasser, Abwasser oder von Abwasserschlamm
,
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
/
B01D
SEPARATION
,
Trennen
/
E03B
Anlagen oder Verfahren zum Gewinnen, Sammeln oder Verteilen von Wasser
,
INSTALLATIONS OR METHODS FOR OBTAINING, COLLECTING, OR DISTRIBUTING WATER
/
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
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