A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
Substrate and method for manufacturing same
A substrate including a textured surface includes a plurality of dimples. A mean maximum dimension of the plurality of dimples along the textured surface is in a range of about 50 nanometers to about 3 microns. A haze of light directly incident on the textured surface through the textured surface is in a range of about 0.5 to about 5%. The textured surface has an average reflectance of about 4% or less over an optical wavelength of 400 nm to 700 nm. The substrate comprises a glass-based material or a ceramic-based material. A method of forming a textured surface includes contacting a substrate with a solution comprising an inorganic polyphosphate for a first period of time while maintaining the solution at a first temperature in the range of about 330 DEG C to about 600 DEG C to form the textured surface.
包括纹理化表面的基板包括多个凹坑。沿着所述纹理化表面的所述多个凹坑的均值最大尺寸在约50纳米至约3微米的范围内。直接入射在所述纹理化表面上的光穿过所述纹理化表面的雾度在约0.5至约5％的范围内。所述纹理化表面在400纳米至700纳米的光学波长内平均的反射率为约4％或更小。所述基板包含基于玻璃的材料或基于陶瓷的材料。形成纹理化表面的方法包括：使基板与包含无机聚磷酸盐的溶液接触第一时间段，同时使所述溶液维持在约330℃至约600℃范围内的第一温度，以形成所述纹理化表面。
Substrate and method for manufacturing same
A substrate including a textured surface includes a plurality of dimples. A mean maximum dimension of the plurality of dimples along the textured surface is in a range of about 50 nanometers to about 3 microns. A haze of light directly incident on the textured surface through the textured surface is in a range of about 0.5 to about 5%. The textured surface has an average reflectance of about 4% or less over an optical wavelength of 400 nm to 700 nm. The substrate comprises a glass-based material or a ceramic-based material. A method of forming a textured surface includes contacting a substrate with a solution comprising an inorganic polyphosphate for a first period of time while maintaining the solution at a first temperature in the range of about 330 DEG C to about 600 DEG C to form the textured surface.
包括纹理化表面的基板包括多个凹坑。沿着所述纹理化表面的所述多个凹坑的均值最大尺寸在约50纳米至约3微米的范围内。直接入射在所述纹理化表面上的光穿过所述纹理化表面的雾度在约0.5至约5％的范围内。所述纹理化表面在400纳米至700纳米的光学波长内平均的反射率为约4％或更小。所述基板包含基于玻璃的材料或基于陶瓷的材料。形成纹理化表面的方法包括：使基板与包含无机聚磷酸盐的溶液接触第一时间段，同时使所述溶液维持在约330℃至约600℃范围内的第一温度，以形成所述纹理化表面。
Substrate and method for manufacturing same
基板及其制造方法
CAO XINYU (author) / HOU JUN (author) / HUANG GUORUI (author) / LI QIAO (author) / LI XIANJIN (author) / ZHU JIANQIANG (author)
2023-10-27
Patent
Electronic Resource
Chinese
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