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A platform for research: civil engineering, architecture and urbanism
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer (12) that is formed by a CVD method and has a corroded surface by having been exposed to plasma etching; and a second SiC layer (13) that is laminated on the corroded surface of the first SiC layer (12) by a CVD method and has a surface that is machined so as to have the predetermined surface profile.
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer (12) that is formed by a CVD method and has a corroded surface by having been exposed to plasma etching; and a second SiC layer (13) that is laminated on the corroded surface of the first SiC layer (12) by a CVD method and has a surface that is machined so as to have the predetermined surface profile.
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
PLASMABESTÄNDIGES ELEMENT UND VERFAHREN ZU SEINER WIEDERHERSTELLUNG
ELÉMENT RÉSISTANT AU PLASMA ET PROCÉDÉ PERMETTANT DE RÉGÉNÉRER CET ÉLÉMENT
KAWAMOTO SATOSHI (author) / NAKAMURA MASAKI (author) / TAKAHARA HIDEYUKI (author) / WU ROBERT (author)
2015-12-30
Patent
Electronic Resource
English
Plasma-resistant coating film, method for producing same, and plasma-resistant member
| European Patent Office | 2023