Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer (12) that is formed by a CVD method and has a corroded surface by having been exposed to plasma etching; and a second SiC layer (13) that is laminated on the corroded surface of the first SiC layer (12) by a CVD method and has a surface that is machined so as to have the predetermined surface profile.
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer (12) that is formed by a CVD method and has a corroded surface by having been exposed to plasma etching; and a second SiC layer (13) that is laminated on the corroded surface of the first SiC layer (12) by a CVD method and has a surface that is machined so as to have the predetermined surface profile.
PLASMA-RESISTANT MEMBER AND METHOD FOR REGENERATING SAME
PLASMABESTÄNDIGES ELEMENT UND VERFAHREN ZU SEINER WIEDERHERSTELLUNG
ELÉMENT RÉSISTANT AU PLASMA ET PROCÉDÉ PERMETTANT DE RÉGÉNÉRER CET ÉLÉMENT
KAWAMOTO SATOSHI (Autor:in) / NAKAMURA MASAKI (Autor:in) / TAKAHARA HIDEYUKI (Autor:in) / WU ROBERT (Autor:in)
30.12.2015
Patent
Elektronische Ressource
Englisch
Plasma-resistant coating film, method for producing same, and plasma-resistant member
| Europäisches Patentamt | 2023