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OXIDE SINTERED BODY, OXIDE SPUTTERING TARGET, CONDUCTIVE OXIDE THIN FILM HAVING HIGH REFRACTIVE INDEX AND METHOD FOR PRODUCING OXIDE SINTERED BODY
PROBLEM TO BE SOLVED: To provide a sintered body that can produce a conductive thin film achieving a high transmittance of visible light and a high refractive index.SOLUTION: The sintered body is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), contains 2-65 mol% of In in terms of InOand 2-65 mol% of Ti or Cr in terms of TiOor CrO, respectively, and satisfies 0.5≤A/B≤5 and 0<10 when an atomic ratio of In (at%) is A, an atomic ratio of Ti or Cr (at%) is B and an atomic ratio of Zn or Sn (at%) is C.
【課題】可視光の高透過率と高屈折率を実現できる導電性薄膜を得ることが可能な焼結体の提供。【解決手段】インジウム(In)、及び、チタン(Ti)又はクロム(Cr)、及び、亜鉛(Zn)又はスズ(Sn)、及び、酸素(O)からなり、InをIn2O3換算で2〜65mol%含有し、Ti又はCrをそれぞれTiO2換算又はCr2O3換算で2〜65mol%含有し、Inの原子比をA(at%)、Ti又はCrの原子比をB(at%)、Zn又はSnの原子比をC(at%)としたとき、0.5≰A/B≰5であり、0<C/(A+B)<10であることを特徴とする焼結体。【選択図】なし
OXIDE SINTERED BODY, OXIDE SPUTTERING TARGET, CONDUCTIVE OXIDE THIN FILM HAVING HIGH REFRACTIVE INDEX AND METHOD FOR PRODUCING OXIDE SINTERED BODY
PROBLEM TO BE SOLVED: To provide a sintered body that can produce a conductive thin film achieving a high transmittance of visible light and a high refractive index.SOLUTION: The sintered body is composed of indium (In), titanium (Ti) or chromium (Cr), zinc (Zn) or tin (Sn), and oxygen (O), contains 2-65 mol% of In in terms of InOand 2-65 mol% of Ti or Cr in terms of TiOor CrO, respectively, and satisfies 0.5≤A/B≤5 and 0<10 when an atomic ratio of In (at%) is A, an atomic ratio of Ti or Cr (at%) is B and an atomic ratio of Zn or Sn (at%) is C.
【課題】可視光の高透過率と高屈折率を実現できる導電性薄膜を得ることが可能な焼結体の提供。【解決手段】インジウム(In)、及び、チタン(Ti)又はクロム(Cr)、及び、亜鉛(Zn)又はスズ(Sn)、及び、酸素(O)からなり、InをIn2O3換算で2〜65mol%含有し、Ti又はCrをそれぞれTiO2換算又はCr2O3換算で2〜65mol%含有し、Inの原子比をA(at%)、Ti又はCrの原子比をB(at%)、Zn又はSnの原子比をC(at%)としたとき、0.5≰A/B≰5であり、0<C/(A+B)<10であることを特徴とする焼結体。【選択図】なし
OXIDE SINTERED BODY, OXIDE SPUTTERING TARGET, CONDUCTIVE OXIDE THIN FILM HAVING HIGH REFRACTIVE INDEX AND METHOD FOR PRODUCING OXIDE SINTERED BODY
酸化物焼結体、酸化物スパッタリングターゲット及び高屈折率の導電性酸化物薄膜並びに酸化物焼結体の製造方法
NARA ATSUSHI (author)
2015-06-11
Patent
Electronic Resource
Japanese
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