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PROBLEM TO BE SOLVED: To provide a method for using a sputtering target which enables an oxide film with a high degree of crystallinity, the oxide film containing a plurality of metal elements, to be formed.SOLUTION: This invention provides a method for using a sputtering target including a polycrystalline oxide containing a plurality of crystal grains. The crystal grains each includes a cleavage plane. An ion is made to collide with the sputtering target, to separate sputtered particles from each cleavage plane. The sputtered particles are positively charged, so that the sputtered particles are deposited uniformly on a deposition surface while repelling each other.
【課題】複数の金属元素を含み、結晶化度の高い酸化物膜を成膜可能なスパッタリング用ターゲットの使用方法を提供する。【解決手段】複数の結晶粒を有する多結晶酸化物を含むスパッタリング用ターゲットの使用方法であって、複数の結晶粒は、劈開面を有し、スパッタリング用ターゲットにイオンを衝突させることによってそれぞれの劈開面からスパッタ粒子を剥離させ、スパッタ粒子が正に帯電することで、スパッタ粒子同士が互いに反発しながら被成膜面に均一に堆積する。【選択図】図1
PROBLEM TO BE SOLVED: To provide a method for using a sputtering target which enables an oxide film with a high degree of crystallinity, the oxide film containing a plurality of metal elements, to be formed.SOLUTION: This invention provides a method for using a sputtering target including a polycrystalline oxide containing a plurality of crystal grains. The crystal grains each includes a cleavage plane. An ion is made to collide with the sputtering target, to separate sputtered particles from each cleavage plane. The sputtered particles are positively charged, so that the sputtered particles are deposited uniformly on a deposition surface while repelling each other.
【課題】複数の金属元素を含み、結晶化度の高い酸化物膜を成膜可能なスパッタリング用ターゲットの使用方法を提供する。【解決手段】複数の結晶粒を有する多結晶酸化物を含むスパッタリング用ターゲットの使用方法であって、複数の結晶粒は、劈開面を有し、スパッタリング用ターゲットにイオンを衝突させることによってそれぞれの劈開面からスパッタ粒子を剥離させ、スパッタ粒子が正に帯電することで、スパッタ粒子同士が互いに反発しながら被成膜面に均一に堆積する。【選択図】図1
METHOD OF FORMING OXIDE FILM
酸化膜の作製方法
YAMAZAKI SHUNPEI (author)
2015-07-02
Patent
Electronic Resource
Japanese
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