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LOW REFLECTION MEMBER
PROBLEM TO BE SOLVED: To provide a low reflection member high in specific rigidity and low in reflection while having high mechanical strength.SOLUTION: There is provided a low reflection member consisting of an alumina sintered body containing oxide of Fe, oxide of Cr, oxide of Ti and oxide of Mn with the content of Al in terms of AlOof 76 mass% or more, sum of the content of Fe in terms of FeOand the content of Cr in terms of CrOof 4 mass% or more and less than 22 mass%, the content of Ti in terms of TiOof 0.3 mass% to 5 mass% and the content of Mn in terms of MnOof 0.1 mass% to 3 mass% based on 100 mass% of the all components constituting the alumina sintered body.SELECTED DRAWING: None
【課題】 高い機械的強度を有しつつ、比剛性が高く、反射率が低い低反射部材を提供する。【解決手段】 Feの酸化物、Crの酸化物、Tiの酸化物、Mnの酸化物を含むアルミナ質焼結体からなり、該アルミナ質焼結体を構成する全成分100質量%のうち、AlをAl2O3換算した含有量が76質量%以上であり、FeをFe2O3換算した含有量とCrをCr2O3換算した含有量との合計が4質量%以上22質量%未満であり、TiをTiO2換算した含有量が0.3質量%以上5質量%以下であり、MnをMnO2換算した含有量が0.1質量%以上3質量%以下の低反射部材である。【選択図】 なし
LOW REFLECTION MEMBER
PROBLEM TO BE SOLVED: To provide a low reflection member high in specific rigidity and low in reflection while having high mechanical strength.SOLUTION: There is provided a low reflection member consisting of an alumina sintered body containing oxide of Fe, oxide of Cr, oxide of Ti and oxide of Mn with the content of Al in terms of AlOof 76 mass% or more, sum of the content of Fe in terms of FeOand the content of Cr in terms of CrOof 4 mass% or more and less than 22 mass%, the content of Ti in terms of TiOof 0.3 mass% to 5 mass% and the content of Mn in terms of MnOof 0.1 mass% to 3 mass% based on 100 mass% of the all components constituting the alumina sintered body.SELECTED DRAWING: None
【課題】 高い機械的強度を有しつつ、比剛性が高く、反射率が低い低反射部材を提供する。【解決手段】 Feの酸化物、Crの酸化物、Tiの酸化物、Mnの酸化物を含むアルミナ質焼結体からなり、該アルミナ質焼結体を構成する全成分100質量%のうち、AlをAl2O3換算した含有量が76質量%以上であり、FeをFe2O3換算した含有量とCrをCr2O3換算した含有量との合計が4質量%以上22質量%未満であり、TiをTiO2換算した含有量が0.3質量%以上5質量%以下であり、MnをMnO2換算した含有量が0.1質量%以上3質量%以下の低反射部材である。【選択図】 なし
LOW REFLECTION MEMBER
低反射部材
HIRANO YOSHINORI (author) / TATEYAMA TAIJI (author)
2016-10-06
Patent
Electronic Resource
Japanese
IPC:
G03F
Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen
,
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
/
C04B
Kalk
,
LIME
/
H01L
Halbleiterbauelemente
,
SEMICONDUCTOR DEVICES
WAVE REFLECTION MEMBER AND METHOD OF CONSTRUCTING WAVE REFLECTION MEMBER
European Patent Office | 2020
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