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CERAMIC STRUCTURE, AND METHOD FOR PRODUCING THE CERAMIC STRUCTURE
PROBLEM TO BE SOLVED: To provide a ceramic structure where, even if working such as grinding and polishing is performed, surface properties are uniformly maintained in a wide range and capable of preventing the leak-out of impurities included in a base material, and a method for producing the ceramic structure.SOLUTION: On the surface layer 31 of a CVD-SiC layer 30 formed on the surface 21 of a body 20 made of SiC, a surface layer 40 made of SiC grains is formed. In the surface layer 40, SiC crystals 41 are random-orientated. Then, in the case a hollow part 22 such as a gap and a crack is provided, the hollow part 22 is formed closer to the side of the CVD-SiC layer 30 than the boundary between the CVD-SiC layer 30 and the surface layer 40. In this way, even in the case the hollow part 22 of surface exposure is present at occurrence probability of a certain degree, the hollow part 22 is present at the inside of the surface layer 40, the phenomenon that impurities included in the base material leak through the hollow part 22 can be prevented, and there is no trouble in the use of a ceramic structure 10.SELECTED DRAWING: Figure 1
【課題】切削や研磨などの加工を施しても広い範囲で表面特性を均一に保持するとともに基材に含まれる不純物が漏れ出るのを防止できるセラミック構造体およびセラミック構造体の製造方法を提供することを目的とする。【解決手段】SiCからなる本体20の表面21に形成されたCVD−SiC層30の表層31には、SiC粒子からなる表面層40が形成されている。表面層40は、SiC結晶41がランダム配向されている。そして、空隙や亀裂等の中空部22を有する場合に、中空部22がCVD−SiC層30と表面層40との境界42よりもCVD−SiC層30側に形成されている。このため、ある程度の発生確率で表面露呈の中空部22が存在していても、中空部22は表面層40の内側に存在するので、基材に含まれる不純物が中空部22を通って漏れ出すのを防止することができ、セラミック構造体10の使用に支障が生じない。【選択図】図1
CERAMIC STRUCTURE, AND METHOD FOR PRODUCING THE CERAMIC STRUCTURE
PROBLEM TO BE SOLVED: To provide a ceramic structure where, even if working such as grinding and polishing is performed, surface properties are uniformly maintained in a wide range and capable of preventing the leak-out of impurities included in a base material, and a method for producing the ceramic structure.SOLUTION: On the surface layer 31 of a CVD-SiC layer 30 formed on the surface 21 of a body 20 made of SiC, a surface layer 40 made of SiC grains is formed. In the surface layer 40, SiC crystals 41 are random-orientated. Then, in the case a hollow part 22 such as a gap and a crack is provided, the hollow part 22 is formed closer to the side of the CVD-SiC layer 30 than the boundary between the CVD-SiC layer 30 and the surface layer 40. In this way, even in the case the hollow part 22 of surface exposure is present at occurrence probability of a certain degree, the hollow part 22 is present at the inside of the surface layer 40, the phenomenon that impurities included in the base material leak through the hollow part 22 can be prevented, and there is no trouble in the use of a ceramic structure 10.SELECTED DRAWING: Figure 1
【課題】切削や研磨などの加工を施しても広い範囲で表面特性を均一に保持するとともに基材に含まれる不純物が漏れ出るのを防止できるセラミック構造体およびセラミック構造体の製造方法を提供することを目的とする。【解決手段】SiCからなる本体20の表面21に形成されたCVD−SiC層30の表層31には、SiC粒子からなる表面層40が形成されている。表面層40は、SiC結晶41がランダム配向されている。そして、空隙や亀裂等の中空部22を有する場合に、中空部22がCVD−SiC層30と表面層40との境界42よりもCVD−SiC層30側に形成されている。このため、ある程度の発生確率で表面露呈の中空部22が存在していても、中空部22は表面層40の内側に存在するので、基材に含まれる不純物が中空部22を通って漏れ出すのを防止することができ、セラミック構造体10の使用に支障が生じない。【選択図】図1
CERAMIC STRUCTURE, AND METHOD FOR PRODUCING THE CERAMIC STRUCTURE
セラミック構造体およびセラミック構造体の製造方法
TAKAGI TAKASHI (author)
2016-12-08
Patent
Electronic Resource
Japanese
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