A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
SPUTTERING TARGET, AND PRODUCTION METHOD FOR SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide a sputtering target capable of depositing easily a blackened layer containing nickel, tungsten, oxygen and nitrogen, and having a stable optical characteristic, in which compositions of two kinds of gases of oxygen and nitrogen in sputtering gas are not required to be controlled highly accurately.SOLUTION: There is provided a sputtering target containing nickel oxide as a primary component, containing tungsten oxide as much as 5-30 mass%, and having an electrical resistivity of 2.2×10to 3.0×10Ωcm.SELECTED DRAWING: None
【課題】スパッタリングガス中の、酸素と、窒素との２種類のガスについて組成を高精度に管理する必要がなく、ニッケル、タングステン、酸素、及び窒素を含有し、安定した光学特性を有する黒化層を容易に成膜することができるスパッタリングターゲットを提供する。【解決手段】酸化ニッケルを主成分とし、さらに酸化タングステンを５〜３０質量％含有し、電気抵抗率が２．２×１０-４〜３．０×１０-２Ωｃｍであるスパッタリングターゲット。【選択図】なし
SPUTTERING TARGET, AND PRODUCTION METHOD FOR SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide a sputtering target capable of depositing easily a blackened layer containing nickel, tungsten, oxygen and nitrogen, and having a stable optical characteristic, in which compositions of two kinds of gases of oxygen and nitrogen in sputtering gas are not required to be controlled highly accurately.SOLUTION: There is provided a sputtering target containing nickel oxide as a primary component, containing tungsten oxide as much as 5-30 mass%, and having an electrical resistivity of 2.2×10to 3.0×10Ωcm.SELECTED DRAWING: None
【課題】スパッタリングガス中の、酸素と、窒素との２種類のガスについて組成を高精度に管理する必要がなく、ニッケル、タングステン、酸素、及び窒素を含有し、安定した光学特性を有する黒化層を容易に成膜することができるスパッタリングターゲットを提供する。【解決手段】酸化ニッケルを主成分とし、さらに酸化タングステンを５〜３０質量％含有し、電気抵抗率が２．２×１０-４〜３．０×１０-２Ωｃｍであるスパッタリングターゲット。【選択図】なし
SPUTTERING TARGET, AND PRODUCTION METHOD FOR SPUTTERING TARGET
スパッタリングターゲット、スパッタリングターゲットの製造方法
SHIMOYAMADA TAKUYA (author)
2017-01-05
Patent
Electronic Resource
Japanese
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