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A platform for research: civil engineering, architecture and urbanism
SINTERED BODY AND SPUTTERING TARGET COMPRISING THE SINTERED BODY, AND THIN FILM FORMED USING THE SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide a sputtering target that has a low bulk resistance value and enables stable DC sputtering, and a thin film having extremely excellent properties in optical properties and high-temperature and high-humidity resistance, as a transparent conductive film for various displays, a protection film for optical disks, and a film for optical control.SOLUTION: A sputtering target and a thin film are a sintered body or a film comprising ZnS and oxide, the sintered body comprising ZnS 40-70 mol%, the oxide in the sintered body comprising a complex oxide at least comprising Zn, Ga, and O, and the sintered body or the film having a composition satisfying the relational expression of 4 at%≤Ga/(Ga+Zn-S)≤18 at%.SELECTED DRAWING: None
【課題】バルク抵抗値が低く、安定したＤＣスパッタリングが可能なスパッタリングターゲット及び各種ディスプレイにおける透明導電膜や光ディスクの保護膜、光学調整用の膜として、光学特性や高温高湿耐性において、極めて優れた特性を有する薄膜を提供する。【解決手段】スパッタリングターゲット及び薄膜は、ＺｎＳと酸化物を含有する焼結体又は膜であって、前記焼結体はＺｎＳを４０〜７０ｍｏｌ％含有し、焼結体中の前記酸化物は少なくともＺｎ，Ｇａ，Ｏからなる複合酸化物を含み、前記焼結体又は膜の組成が４ａｔ％≦Ｇａ／（Ｇａ＋Ｚｎ−Ｓ）≦１８ａｔ％の関係式を満たす。【選択図】なし
SINTERED BODY AND SPUTTERING TARGET COMPRISING THE SINTERED BODY, AND THIN FILM FORMED USING THE SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide a sputtering target that has a low bulk resistance value and enables stable DC sputtering, and a thin film having extremely excellent properties in optical properties and high-temperature and high-humidity resistance, as a transparent conductive film for various displays, a protection film for optical disks, and a film for optical control.SOLUTION: A sputtering target and a thin film are a sintered body or a film comprising ZnS and oxide, the sintered body comprising ZnS 40-70 mol%, the oxide in the sintered body comprising a complex oxide at least comprising Zn, Ga, and O, and the sintered body or the film having a composition satisfying the relational expression of 4 at%≤Ga/(Ga+Zn-S)≤18 at%.SELECTED DRAWING: None
【課題】バルク抵抗値が低く、安定したＤＣスパッタリングが可能なスパッタリングターゲット及び各種ディスプレイにおける透明導電膜や光ディスクの保護膜、光学調整用の膜として、光学特性や高温高湿耐性において、極めて優れた特性を有する薄膜を提供する。【解決手段】スパッタリングターゲット及び薄膜は、ＺｎＳと酸化物を含有する焼結体又は膜であって、前記焼結体はＺｎＳを４０〜７０ｍｏｌ％含有し、焼結体中の前記酸化物は少なくともＺｎ，Ｇａ，Ｏからなる複合酸化物を含み、前記焼結体又は膜の組成が４ａｔ％≦Ｇａ／（Ｇａ＋Ｚｎ−Ｓ）≦１８ａｔ％の関係式を満たす。【選択図】なし
SINTERED BODY AND SPUTTERING TARGET COMPRISING THE SINTERED BODY, AND THIN FILM FORMED USING THE SPUTTERING TARGET
焼結体及び該焼結体からなるスパッタリングターゲット並びに該スパッタリングターゲットを用いて形成した薄膜
NARA ATSUSHI (author)
2017-04-27
Patent
Electronic Resource
Japanese
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