A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
ION-ASSISTED DEPOSITION TOP COAT OF RARE EARTH OXIDE
PROBLEM TO BE SOLVED: To provide a chamber component protective film having an anti-plasma erosion resistance to an etching reactor article.SOLUTION: In order to deposit a first protective layer on at least one surface of a chamber component, a plasma erosion deposition process is executed, and a first protective layer is a plasma resistance ceramic having a thickness larger than about 50 microns and pluralities of cracks and pores. After this, in order to deposit a second protective layer over the first protective layer, there is executed an ion assist deposition (IAD) process. A second protective layer is a plasma resistance rare earth oxide having a thickness less than 50 microns and a vacancy percentage of less than 1%, and the second protective layer seals the cracks and pores of the first protective layer thereby to perform a role as a barrier for preventing a reaction with a metal.SELECTED DRAWING: Figure 6B
【課題】エッチングリアクタ用の物品に対する耐プラズマ浸食性のチャンバコンポーネント保護膜の提供。【解決手段】チャンバコンポーネントの少なくとも１つの表面上に第１保護層を堆積させるために、プラズマ溶射堆積プロセスが実行され、第１保護層が、約５０ミクロンよりも大きい厚さと、複数の亀裂及び細孔とを有する耐プラズマ性セラミックスである。その後、第１保護層上に第２保護層を堆積させるために、イオンアシスト蒸着（ＩＡＤ）プロセスが実行され、第２保護層が、５０ミクロン未満の厚さと、１％未満の空孔率とを有する耐プラズマ性希土類酸化物であり、第２保護層が、第１保護層の複数の亀裂及び細孔を封止し、金属との反応を防止するためのバリアとしての役目を果たすチャンバコンポーネント。【選択図】図６Ｂ
ION-ASSISTED DEPOSITION TOP COAT OF RARE EARTH OXIDE
PROBLEM TO BE SOLVED: To provide a chamber component protective film having an anti-plasma erosion resistance to an etching reactor article.SOLUTION: In order to deposit a first protective layer on at least one surface of a chamber component, a plasma erosion deposition process is executed, and a first protective layer is a plasma resistance ceramic having a thickness larger than about 50 microns and pluralities of cracks and pores. After this, in order to deposit a second protective layer over the first protective layer, there is executed an ion assist deposition (IAD) process. A second protective layer is a plasma resistance rare earth oxide having a thickness less than 50 microns and a vacancy percentage of less than 1%, and the second protective layer seals the cracks and pores of the first protective layer thereby to perform a role as a barrier for preventing a reaction with a metal.SELECTED DRAWING: Figure 6B
【課題】エッチングリアクタ用の物品に対する耐プラズマ浸食性のチャンバコンポーネント保護膜の提供。【解決手段】チャンバコンポーネントの少なくとも１つの表面上に第１保護層を堆積させるために、プラズマ溶射堆積プロセスが実行され、第１保護層が、約５０ミクロンよりも大きい厚さと、複数の亀裂及び細孔とを有する耐プラズマ性セラミックスである。その後、第１保護層上に第２保護層を堆積させるために、イオンアシスト蒸着（ＩＡＤ）プロセスが実行され、第２保護層が、５０ミクロン未満の厚さと、１％未満の空孔率とを有する耐プラズマ性希土類酸化物であり、第２保護層が、第１保護層の複数の亀裂及び細孔を封止し、金属との反応を防止するためのバリアとしての役目を果たすチャンバコンポーネント。【選択図】図６Ｂ
ION-ASSISTED DEPOSITION TOP COAT OF RARE EARTH OXIDE
希土類酸化物のイオンアシスト蒸着トップコート
JENNIFER Y SUN (author) / BIRAJA P KANUNGO (author) / VAHID FIROUZDOR (author)
2018-05-24
Patent
Electronic Resource
Japanese
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