A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES
PROBLEM TO BE SOLVED: To provide chamber lids and chamber nozzles having a plasma resistant protective layer of chamber component thin film for a processing chamber.SOLUTION: A plasma resistant rare earth oxide film comprises: a ceramic body with at least one surface having a first average surface roughness of 8 to 16 micro inch; and a conformal protective layer over at least one surface of the ceramic body, the conformal protective layer comprising 40 to 100 mol% of YO, 0 to 60 mol% of ZrO, and 0 to 10 mol% of AlO. The conformal protective layer has a uniform thickness of less than 300 μm over the at least one surface and has a second average surface roughness of 10 micro inch or less. A chamber component for a processing chamber has a second average surface roughness that is smaller than a first surface roughness thereof.SELECTED DRAWING: Figure 6
【課題】処理チャンバ用チャンバコンポーメント薄膜の耐プラズマ性保護層を有するチャンバ蓋及びチャンバノズルの提供。【解決手段】８〜１６マイクロインチの第１の平均表面粗さを有する少なくとも１つの表面を有するセラミック体と、セラミック体の少なくとも１つの表面上のコンフォーマルな保護層とを含み、コンフォーマルな保護層は、４０〜１００モル％のＹ２Ｏ３と、０〜６０モル％のＺｒＯ２と、０〜１０モル％のＡｌ２Ｏ３とを含む耐プラズマ性希土類酸化物膜であり、コンフォーマルな保護層は、前記少なくとも１つの表面の上に３００μｍ未満の均一な厚さを有し、１０マイクロインチ以下の第２の平均表面粗さを有し、第２の平均表面粗さは、第１の平均表面粗さよりも小さい処理チャンバ用のチャンバコンポーネント。【選択図】図６
ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES
PROBLEM TO BE SOLVED: To provide chamber lids and chamber nozzles having a plasma resistant protective layer of chamber component thin film for a processing chamber.SOLUTION: A plasma resistant rare earth oxide film comprises: a ceramic body with at least one surface having a first average surface roughness of 8 to 16 micro inch; and a conformal protective layer over at least one surface of the ceramic body, the conformal protective layer comprising 40 to 100 mol% of YO, 0 to 60 mol% of ZrO, and 0 to 10 mol% of AlO. The conformal protective layer has a uniform thickness of less than 300 μm over the at least one surface and has a second average surface roughness of 10 micro inch or less. A chamber component for a processing chamber has a second average surface roughness that is smaller than a first surface roughness thereof.SELECTED DRAWING: Figure 6
【課題】処理チャンバ用チャンバコンポーメント薄膜の耐プラズマ性保護層を有するチャンバ蓋及びチャンバノズルの提供。【解決手段】８〜１６マイクロインチの第１の平均表面粗さを有する少なくとも１つの表面を有するセラミック体と、セラミック体の少なくとも１つの表面上のコンフォーマルな保護層とを含み、コンフォーマルな保護層は、４０〜１００モル％のＹ２Ｏ３と、０〜６０モル％のＺｒＯ２と、０〜１０モル％のＡｌ２Ｏ３とを含む耐プラズマ性希土類酸化物膜であり、コンフォーマルな保護層は、前記少なくとも１つの表面の上に３００μｍ未満の均一な厚さを有し、１０マイクロインチ以下の第２の平均表面粗さを有し、第２の平均表面粗さは、第１の平均表面粗さよりも小さい処理チャンバ用のチャンバコンポーネント。【選択図】図６
ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES
蓋及びノズル上の希土類酸化物系コーティング用イオンアシスト蒸着
JENNIFER Y SUN (author) / BIRAJA P KANUNGO (author) / VAHID FIROUZDOR (author) / ZHANG YING (author)
2018-06-07
Patent
Electronic Resource
Japanese
ION ASSISTED DEPOSITION FOR RARE-EARTH OXIDE BASED COATINGS ON LIDS AND NOZZLES
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