A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
OXIDE SINTERED PRODUCT, METHOD FOR MANUFACTURING THE SAME, AND SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide an oxide sintered product and a sputtering target suitably used for manufacturing an oxide semiconductor film for a display device, the sputtering target having high conductivity and excellent discharge stability.SOLUTION: An oxide sintered product has a bixbyite phase composed of InO, and an ABOphase (where A is one or more element selected from the group consisting of Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu, and B is one or more element selected from the group consisting of Al and Ga).SELECTED DRAWING: Figure 1
【課題】表示装置用酸化物半導体膜の製造に好適に用いられる酸化物焼結体及びスパッタリングターゲットであって、高い導電性を有し、放電安定性に優れたスパッタリングターゲットを提供する。【解決手段】Ｉｎ２Ｏ３で構成されるビックスバイト相と、Ａ３Ｂ５Ｏ１２相（式中、ＡはＳｃ，Ｙ，Ｌａ，Ｃｅ，Ｐｒ，Ｎｄ，Ｐｍ，Ｓｍ，Ｅｕ，Ｇｄ，Ｔｂ，Ｄｙ，Ｈｏ，Ｅｒ，Ｔｍ，Ｙｂ及びＬｕからなる群から選ばれる一以上の元素であり、ＢはＡｌ及びＧａからなる群から選ばれる一以上の元素である。）を含む酸化物焼結体。【選択図】図１
OXIDE SINTERED PRODUCT, METHOD FOR MANUFACTURING THE SAME, AND SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide an oxide sintered product and a sputtering target suitably used for manufacturing an oxide semiconductor film for a display device, the sputtering target having high conductivity and excellent discharge stability.SOLUTION: An oxide sintered product has a bixbyite phase composed of InO, and an ABOphase (where A is one or more element selected from the group consisting of Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu, and B is one or more element selected from the group consisting of Al and Ga).SELECTED DRAWING: Figure 1
【課題】表示装置用酸化物半導体膜の製造に好適に用いられる酸化物焼結体及びスパッタリングターゲットであって、高い導電性を有し、放電安定性に優れたスパッタリングターゲットを提供する。【解決手段】Ｉｎ２Ｏ３で構成されるビックスバイト相と、Ａ３Ｂ５Ｏ１２相（式中、ＡはＳｃ，Ｙ，Ｌａ，Ｃｅ，Ｐｒ，Ｎｄ，Ｐｍ，Ｓｍ，Ｅｕ，Ｇｄ，Ｔｂ，Ｄｙ，Ｈｏ，Ｅｒ，Ｔｍ，Ｙｂ及びＬｕからなる群から選ばれる一以上の元素であり、ＢはＡｌ及びＧａからなる群から選ばれる一以上の元素である。）を含む酸化物焼結体。【選択図】図１
OXIDE SINTERED PRODUCT, METHOD FOR MANUFACTURING THE SAME, AND SPUTTERING TARGET
酸化物焼結体、その製造方法及びスパッタリングターゲット
TOMAI SHIGEKAZU (author) / INOUE KAZUYOSHI (author) / EBATA KAZUAKI (author) / SHIBATA MASATOSHI (author) / UTSUNO FUTOSHI (author) / TSURUMA YUKI (author) / ISHIHARA YU (author)
2018-10-11
Patent
Electronic Resource
Japanese
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