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OXIDE SPUTTERING FILM, METHOD FOR PRODUCING OXIDE SPUTTERING FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
To provide an oxide sputtering film that has, in direct-current sputtering with high mass productivity, excellent transparency, excellent water vapor barrier performance, and oxygen barrier performance, and a method for producing an oxide sputtering film, an oxide sintered body and a transparent resin substrate.SOLUTION: An oxide sputtering film contains Zn and Sn, is amorphous and transparent, and has water vapor barrier performance or oxygen barrier performance, with the ratio between the metal atoms of Zn and Sn, Sn/(Zn+Sn), of 0.18 or more and 0.29 or less.SELECTED DRAWING: None
【課題】量産性の高い直流スパッタリングにて、優れた透明性、良好な水蒸気バリア性能、酸素バリア性能を有する、酸化物スパッタ膜、酸化物スパッタ膜の製造方法、酸化物焼結体及び透明樹脂基板を提供することを目的とする。【解決手段】ZnとSnとを含有する非晶質の透明な水蒸気バリア性能もしくは酸素バリア性能を有する酸化物スパッタ膜であって、前記ZnとSnの金属原子数比のSn/(Zn+Sn)が0.18以上0.29以下であることを特徴とする。【選択図】なし
OXIDE SPUTTERING FILM, METHOD FOR PRODUCING OXIDE SPUTTERING FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
To provide an oxide sputtering film that has, in direct-current sputtering with high mass productivity, excellent transparency, excellent water vapor barrier performance, and oxygen barrier performance, and a method for producing an oxide sputtering film, an oxide sintered body and a transparent resin substrate.SOLUTION: An oxide sputtering film contains Zn and Sn, is amorphous and transparent, and has water vapor barrier performance or oxygen barrier performance, with the ratio between the metal atoms of Zn and Sn, Sn/(Zn+Sn), of 0.18 or more and 0.29 or less.SELECTED DRAWING: None
【課題】量産性の高い直流スパッタリングにて、優れた透明性、良好な水蒸気バリア性能、酸素バリア性能を有する、酸化物スパッタ膜、酸化物スパッタ膜の製造方法、酸化物焼結体及び透明樹脂基板を提供することを目的とする。【解決手段】ZnとSnとを含有する非晶質の透明な水蒸気バリア性能もしくは酸素バリア性能を有する酸化物スパッタ膜であって、前記ZnとSnの金属原子数比のSn/(Zn+Sn)が0.18以上0.29以下であることを特徴とする。【選択図】なし
OXIDE SPUTTERING FILM, METHOD FOR PRODUCING OXIDE SPUTTERING FILM, OXIDE SINTERED BODY AND TRANSPARENT RESIN SUBSTRATE
酸化物スパッタ膜、酸化物スパッタ膜の製造方法、酸化物焼結体及び透明樹脂基板
KUWAHARA MASAKAZU (author) / NITO SHIGEO (author)
2019-08-08
Patent
Electronic Resource
Japanese
OXIDE SINTERED BODY, SPUTTERING TARGET, AND TRANSPARENT CONDUCTIVE FILM
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