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To provide a method of producing an inorganic porous body of high porosity by causing a solid composition comprising shirasu and/or silica as its main component to thermally expand at a low temperature of about 300°C, and an inorganic porous body of high porosity and low thermal conductivity according to the method.SOLUTION: There is provided an inorganic porous body 2 of high porosity comprising shirasu and/or silica as its main component and having porosity of 80% or higher and thermal conductivity of 0.03 W/mk or lower. The method of producing the same is carried out by dissolving, mixing and reacting a composition comprising shirasu and/or silica as its main component in an alkaline solution containing an alkaline substance to produce a solid composition, and by causing the solid composition to thermally expand at a temperature of 500°C or lower.SELECTED DRAWING: Figure 1
【課題】シラス及び／又はシリカを主成分とした固体組成物を、低温である３００℃付近で加熱膨張させる高多孔率無機多孔体の製造方法と、その製造方法による高い気孔率と低い熱伝導率を有する高多孔率無機多孔体を提供すること。【解決手段】シラス及び／又はシリカを主成分とする気孔率８０％以上かつ熱伝導率０．０３Ｗ／ｍｋ以下である高多孔率無機多孔体２であり、その製造方法は、塩基性物質を含むアルカリ性溶液にシラス及び／又はシリカを主成分とする組成物を溶解、混合し反応させて固形組成物とし、５００℃以下で加熱膨張させることである。【選択図】図１
To provide a method of producing an inorganic porous body of high porosity by causing a solid composition comprising shirasu and/or silica as its main component to thermally expand at a low temperature of about 300°C, and an inorganic porous body of high porosity and low thermal conductivity according to the method.SOLUTION: There is provided an inorganic porous body 2 of high porosity comprising shirasu and/or silica as its main component and having porosity of 80% or higher and thermal conductivity of 0.03 W/mk or lower. The method of producing the same is carried out by dissolving, mixing and reacting a composition comprising shirasu and/or silica as its main component in an alkaline solution containing an alkaline substance to produce a solid composition, and by causing the solid composition to thermally expand at a temperature of 500°C or lower.SELECTED DRAWING: Figure 1
【課題】シラス及び／又はシリカを主成分とした固体組成物を、低温である３００℃付近で加熱膨張させる高多孔率無機多孔体の製造方法と、その製造方法による高い気孔率と低い熱伝導率を有する高多孔率無機多孔体を提供すること。【解決手段】シラス及び／又はシリカを主成分とする気孔率８０％以上かつ熱伝導率０．０３Ｗ／ｍｋ以下である高多孔率無機多孔体２であり、その製造方法は、塩基性物質を含むアルカリ性溶液にシラス及び／又はシリカを主成分とする組成物を溶解、混合し反応させて固形組成物とし、５００℃以下で加熱膨張させることである。【選択図】図１
INORGANIC POROUS BODY OF HIGH POROSITY
高多孔率無機多孔体
FUJI MASATADA (author)
2019-08-29
Patent
Electronic Resource
Japanese
IPC:
C04B
Kalk
,
LIME
POROUS INORGANIC SINTERED BODY AND METHOD OF PRODUCING POROUS INORGANIC SINTERED BODY
| European Patent Office | 2021