A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
SINTERED COMPACT OF YTTRIUM OXYFLUORIDE AND SEMICONDUCTOR MANUFACTURING DEVICE MEMBER USING THE SAME
To provide a sintered compact of yttrium oxyfluoride which is easily heated by radiation and dissipates heat while maintaining a composition for securing corrosion resistance against plasma such as halogen and oxygen.SOLUTION: A sintered compact of yttrium oxyfluoride containing both Y5O4F7 and YF3 as a main ingredient contains 0.02 to 0.3 wt.% of carbon, and has an L value of 20 to 55 in a Lab color space.SELECTED DRAWING: Figure 1
【課題】 ハロゲンや酸素などのプラズマに対する耐食性を確保できる組成を維持しながら輻射加熱、放熱しやすいオキシフッ化イットリウムの焼結体を提供する。【解決手段】 Ｙ５Ｏ４Ｆ７とＹＦ３を主成分とするオキシフッ化イットリウムの焼結体であって、０．０２～０．３重量％のカーボンを含有し、Ｌａｂ表色系においてＬ値が２０～５５であることを特徴とするオキシフッ化イットリウムの焼結体。【選択図】 図１
SINTERED COMPACT OF YTTRIUM OXYFLUORIDE AND SEMICONDUCTOR MANUFACTURING DEVICE MEMBER USING THE SAME
To provide a sintered compact of yttrium oxyfluoride which is easily heated by radiation and dissipates heat while maintaining a composition for securing corrosion resistance against plasma such as halogen and oxygen.SOLUTION: A sintered compact of yttrium oxyfluoride containing both Y5O4F7 and YF3 as a main ingredient contains 0.02 to 0.3 wt.% of carbon, and has an L value of 20 to 55 in a Lab color space.SELECTED DRAWING: Figure 1
【課題】 ハロゲンや酸素などのプラズマに対する耐食性を確保できる組成を維持しながら輻射加熱、放熱しやすいオキシフッ化イットリウムの焼結体を提供する。【解決手段】 Ｙ５Ｏ４Ｆ７とＹＦ３を主成分とするオキシフッ化イットリウムの焼結体であって、０．０２～０．３重量％のカーボンを含有し、Ｌａｂ表色系においてＬ値が２０～５５であることを特徴とするオキシフッ化イットリウムの焼結体。【選択図】 図１
SINTERED COMPACT OF YTTRIUM OXYFLUORIDE AND SEMICONDUCTOR MANUFACTURING DEVICE MEMBER USING THE SAME
オキシフッ化イットリウムの焼結体及び該オキシフッ化イットリウムの焼結体を用いた半導体製造装置用部材
SATO EMIKO (author) / ITO YASUTAKA (author)
2022-10-03
Patent
Electronic Resource
Japanese
| European Patent Office | 2023
European Patent Office | 2023
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