A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
MEMBER FOR PLASMA PROCESSING DEVICE
To provide a member for a plasma processing device, in which a glassy material layer is formed on a base material made of sintered ceramics to maintain the flatness of the base material, and a plasma resistant material such as Y2O3 is formed on the glassy material layer.SOLUTION: This invention relates to a member for a plasma processing device in which a glassy material layer is formed on a surface of a base material made of sintered ceramics, and a plasma-resistant material layer is formed on a top surface of the glassy material layer, wherein the surface of the base material has 15 to 35 recesses per unit area of 50 μm×50 μm, the diameter of the largest inscribed circle at an opening part being 1 μm to 15 μm; the recesses are filled with glassy material of the glassy material layer; the plasma-resistant material layer has no vacancies; and a maximum height Rz on the surface thereof is 1 μm or less.SELECTED DRAWING: None
【課題】セラミックス焼結体からなる基材上に、前記基材の平坦性を維持するようにガラス質材料層が形成され、さらにガラス質材料層の上に、Ｙ2Ｏ3などの耐プラズマ性材料が形成されたプラズマ処理装置用の部材を提供する。【解決手段】セラミックス焼結体からなる基材表面にガラス質材料層が形成され、さらにその上面に耐プラズマ材料層が形成されたプラズマ処理装置用部材であって、前記基材表面には、開口部における最大内接円の直径が１μｍ～１５μｍである凹部を５０μｍ×５０μｍの単位面積当たり１５個～３５個有し、前記凹部は、前記ガラス質材料層のガラス質材料で充填され、前記耐プラズマ材料層には空孔が存在せず、その表面の最大高さＲｚが１μｍ以下であることを特徴とするプラズマ処理装置用部材。【選択図】なし
MEMBER FOR PLASMA PROCESSING DEVICE
To provide a member for a plasma processing device, in which a glassy material layer is formed on a base material made of sintered ceramics to maintain the flatness of the base material, and a plasma resistant material such as Y2O3 is formed on the glassy material layer.SOLUTION: This invention relates to a member for a plasma processing device in which a glassy material layer is formed on a surface of a base material made of sintered ceramics, and a plasma-resistant material layer is formed on a top surface of the glassy material layer, wherein the surface of the base material has 15 to 35 recesses per unit area of 50 μm×50 μm, the diameter of the largest inscribed circle at an opening part being 1 μm to 15 μm; the recesses are filled with glassy material of the glassy material layer; the plasma-resistant material layer has no vacancies; and a maximum height Rz on the surface thereof is 1 μm or less.SELECTED DRAWING: None
【課題】セラミックス焼結体からなる基材上に、前記基材の平坦性を維持するようにガラス質材料層が形成され、さらにガラス質材料層の上に、Ｙ2Ｏ3などの耐プラズマ性材料が形成されたプラズマ処理装置用の部材を提供する。【解決手段】セラミックス焼結体からなる基材表面にガラス質材料層が形成され、さらにその上面に耐プラズマ材料層が形成されたプラズマ処理装置用部材であって、前記基材表面には、開口部における最大内接円の直径が１μｍ～１５μｍである凹部を５０μｍ×５０μｍの単位面積当たり１５個～３５個有し、前記凹部は、前記ガラス質材料層のガラス質材料で充填され、前記耐プラズマ材料層には空孔が存在せず、その表面の最大高さＲｚが１μｍ以下であることを特徴とするプラズマ処理装置用部材。【選択図】なし
MEMBER FOR PLASMA PROCESSING DEVICE
プラズマ処理装置用部材
KATO SACHIKO (author) / NAKAGAWA TAKUYA (author) / FUKAZAWA YUJI (author) / ABE YOSHIHISA (author)
2023-10-11
Patent
Electronic Resource
Japanese
IPC:
C04B
Kalk
,
LIME
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