A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
The present invention provides a method for manufacturing indium oxide-zinc oxide based oxide (IZO) sintered body target in which warping of a sintered body is small and in-plane deviation of a bulk resistivity due to grinding is suppressed for reducing warpage. The sputtering target is made of In, Zn, and O, and is characterized by having the atomic ratio of Zn and In which satisfies 0.05 <= Zn / (In + Zn) <= 0.30 and having a standard deviation of bulk resistivity of the sputter surface of the target which is equal to or less than 0.1 mΩ·cm.
In, Zn, O 로 이루어지는 스퍼터링 타깃으로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In ＋ Zn) ≤ 0.30 을 만족시키고, 그 타깃의 스퍼터 면에 있어서의 벌크 저항률의 표준 편차가 0.1 mΩ·㎝ 이하인 것을 특징으로 하는 스퍼터링 타깃. 소결체의 휨이 적고, 휨 저감을 위한 연삭에 의한 벌크 저항률의 면내 편차가 억제된 산화인듐-산화아연계 산화물 (IZO) 소결체 타깃의 제조 방법을 제공한다.
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
The present invention provides a method for manufacturing indium oxide-zinc oxide based oxide (IZO) sintered body target in which warping of a sintered body is small and in-plane deviation of a bulk resistivity due to grinding is suppressed for reducing warpage. The sputtering target is made of In, Zn, and O, and is characterized by having the atomic ratio of Zn and In which satisfies 0.05 <= Zn / (In + Zn) <= 0.30 and having a standard deviation of bulk resistivity of the sputter surface of the target which is equal to or less than 0.1 mΩ·cm.
In, Zn, O 로 이루어지는 스퍼터링 타깃으로서, Zn 과 In 의 원자비가 0.05 ≤ Zn/(In ＋ Zn) ≤ 0.30 을 만족시키고, 그 타깃의 스퍼터 면에 있어서의 벌크 저항률의 표준 편차가 0.1 mΩ·㎝ 이하인 것을 특징으로 하는 스퍼터링 타깃. 소결체의 휨이 적고, 휨 저감을 위한 연삭에 의한 벌크 저항률의 면내 편차가 억제된 산화인듐-산화아연계 산화물 (IZO) 소결체 타깃의 제조 방법을 제공한다.
- IZO INDIUM ZINC OXIDE IZO BASED SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
산화인듐-산화아연계 (IZO) 스퍼터링 타깃 및 그 제조 방법
KAKENO TAKASHI (author)
2018-07-17
Patent
Electronic Resource
Korean
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