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A platform for research: civil engineering, architecture and urbanism
SINTERED BODY OF MOLYBDENUM OXIDE, SPUTTERING TARGET, AND OXIDE THIN FILM
The present invention provides a sintered body of molybdenum-based oxide, a sputerring target comprising the sintered body, and an oxide thin film formed from same. In the present invention, a particular dopant is added to sinter-resistant molybdenum oxide and niobium oxide within a certain amount range, and thus, even with pressureless sintering, improved sinterability, high-density characteristics, thin film uniformity through particle growth control, and low-reflection and low-resistance characteristics can be ensured at the same time.
La présente invention concerne un corps fritté en oxyde à base de molybdène, une cible de pulvérisation comprenant le corps fritté, et un film mince d'oxyde formé à partir de celui-ci. Dans la présente invention, un dopant particulier est ajouté à de l'oxyde de molybdène résistant au frittage et à de l'oxyde de niobium dans une certaine plage de quantité, et ainsi, même avec un frittage sans pression, une aptitude au frittage améliorée, des caractéristiques de haute densité, une uniformité du film mince par régulation de la croissance des particules, et des caractéristiques de faible réflexion et de faible résistance peuvent être assurées en même temps.
본 발명은 몰리브덴계 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 도펀트를 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 입자 성장 제어를 통한 박막의 균일성, 저반사 및 저저항 특성을 동시에 확보할 수 있다.
SINTERED BODY OF MOLYBDENUM OXIDE, SPUTTERING TARGET, AND OXIDE THIN FILM
The present invention provides a sintered body of molybdenum-based oxide, a sputerring target comprising the sintered body, and an oxide thin film formed from same. In the present invention, a particular dopant is added to sinter-resistant molybdenum oxide and niobium oxide within a certain amount range, and thus, even with pressureless sintering, improved sinterability, high-density characteristics, thin film uniformity through particle growth control, and low-reflection and low-resistance characteristics can be ensured at the same time.
La présente invention concerne un corps fritté en oxyde à base de molybdène, une cible de pulvérisation comprenant le corps fritté, et un film mince d'oxyde formé à partir de celui-ci. Dans la présente invention, un dopant particulier est ajouté à de l'oxyde de molybdène résistant au frittage et à de l'oxyde de niobium dans une certaine plage de quantité, et ainsi, même avec un frittage sans pression, une aptitude au frittage améliorée, des caractéristiques de haute densité, une uniformité du film mince par régulation de la croissance des particules, et des caractéristiques de faible réflexion et de faible résistance peuvent être assurées en même temps.
본 발명은 몰리브덴계 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 도펀트를 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 입자 성장 제어를 통한 박막의 균일성, 저반사 및 저저항 특성을 동시에 확보할 수 있다.
SINTERED BODY OF MOLYBDENUM OXIDE, SPUTTERING TARGET, AND OXIDE THIN FILM
CORPS FRITTÉ EN OXYDE DE MOLYBDÈNE, CIBLE DE PULVÉRISATION ET FILM MINCE D'OXYDE
몰리브덴 산화물 소결체, 스퍼터링 타겟 및 산화물 박막
JANG BONGJUNG (author) / PARK JAESOUNG (author) / LEE HYOWON (author) / LEE SEUNGYI (author) / HWANG BYUNGJIN (author) / PARK SANGYONG (author) / YUN EUNSUB (author) / JIN SEUNGHYEON (author) / YANG SEUNGHO (author)
2024-10-17
Patent
Electronic Resource
Korean
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