A platform for research: civil engineering, architecture and urbanism
CRYSTALLINE OXIDE SEMICONDUCTOR THIN FILM, LAMINATE MANUFACTURING METHOD, THIN FILM TRANSISTOR, THIN FILM TRANSISTOR MANUFACTURING METHOD, ELECTRONIC DEVICE, AND IN-VEHICLE DISPLAY DEVICE
A crystalline oxide semiconductor thin film that has indium oxide as a primary component, includes surface crystal particles with a single crystal orientation, and has a band gap of 3.90eV or greater.
L'invention concerne une couche mince semi-conductrice d'oxyde cristalline qui comprend de l'oxyde d'indium comme composant principal. Cette couche comporte des particules de cristal de surface ayant une orientation de monocristal, et présente une bande interdite égale ou supérieure à 3,90 eV.
酸化インジウムを主成分とし、単一の結晶方位を有する表面結晶粒子を含み、バンドギャップが3.90eV以上である、結晶質酸化物半導体薄膜。
CRYSTALLINE OXIDE SEMICONDUCTOR THIN FILM, LAMINATE MANUFACTURING METHOD, THIN FILM TRANSISTOR, THIN FILM TRANSISTOR MANUFACTURING METHOD, ELECTRONIC DEVICE, AND IN-VEHICLE DISPLAY DEVICE
A crystalline oxide semiconductor thin film that has indium oxide as a primary component, includes surface crystal particles with a single crystal orientation, and has a band gap of 3.90eV or greater.
L'invention concerne une couche mince semi-conductrice d'oxyde cristalline qui comprend de l'oxyde d'indium comme composant principal. Cette couche comporte des particules de cristal de surface ayant une orientation de monocristal, et présente une bande interdite égale ou supérieure à 3,90 eV.
酸化インジウムを主成分とし、単一の結晶方位を有する表面結晶粒子を含み、バンドギャップが3.90eV以上である、結晶質酸化物半導体薄膜。
CRYSTALLINE OXIDE SEMICONDUCTOR THIN FILM, LAMINATE MANUFACTURING METHOD, THIN FILM TRANSISTOR, THIN FILM TRANSISTOR MANUFACTURING METHOD, ELECTRONIC DEVICE, AND IN-VEHICLE DISPLAY DEVICE
COUCHE MINCE SEMI-CONDUCTRICE D'OXYDE CRISTALLINE, PROCÉDÉ DE FABRICATION DE STRATIFIÉ, TRANSISTOR À COUCHES MINCES, PROCÉDÉ DE FABRICATION DE TRANSISTOR À COUCHES MINCES, DISPOSITIF ÉLECTRONIQUE ET DISPOSITIF D'AFFICHAGE EMBARQUÉ
結晶質酸化物半導体薄膜、積層体の製造方法、薄膜トランジスタ、薄膜トランジスタの製造方法、電子機器、車載用表示装置
INOUE KAZUYOSHI (author) / SHIBATA MASATOSHI (author) / TSURUMA YUKI (author) / KAWASHIMA EMI (author) / TAKESHIMA MOTOHIRO (author)
2018-08-09
Patent
Electronic Resource
Japanese
OXIDE SEMICONDUCTOR THIN FILM AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR
European Patent Office | 2018
|European Patent Office | 2017
|European Patent Office | 2021
|OXIDE SEMICONDUCTOR THIN FILM OF THIN FILM TRANSISTOR, THIN FILM TRANSISTOR AND SPUTTERING TARGET
European Patent Office | 2016
|OXIDE SEMICONDUCTOR THIN FILM OF THIN FILM TRANSISTOR, THIN FILM TRANSISTOR AND SPUTTERING TARGET
European Patent Office | 2016
|