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High-density optical disk pattern mastering using nanoimprint lithography
We demonstrated nanoimprint lithography for the high-density optical disk pattern mastering. The nickel electroplated optical disk patterns with pit lengths of ∼ 105 nm, ∼ 67 nm, and ∼ 40 nm on the nanoimprinted optical disk patterns were successfully fabricated. Because of the advanced technology, it has great possibility that the next generation high-density optical disk will be manufactured by nanoimprint lithography mastering technology.
High-density optical disk pattern mastering using nanoimprint lithography
We demonstrated nanoimprint lithography for the high-density optical disk pattern mastering. The nickel electroplated optical disk patterns with pit lengths of ∼ 105 nm, ∼ 67 nm, and ∼ 40 nm on the nanoimprinted optical disk patterns were successfully fabricated. Because of the advanced technology, it has great possibility that the next generation high-density optical disk will be manufactured by nanoimprint lithography mastering technology.
High-density optical disk pattern mastering using nanoimprint lithography
Choon-Gi Choi, (author)
2006-10-01
1112143 byte
Conference paper
Electronic Resource
English
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