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Application of UV nanoimprint lithography in polymer photonic nano-systems
We report an application of UV nanoimprint lithography for the fabrication of two-dimensional polymer photonic crystal slab waveguides. With the aid of optimized resin droplet size and imprint pressure, air-hole photonic crystal structures were replicated on the optical polymer resin. By incorporating buffered oxide etch process, the glass substrate was selectively etched and the imprinted polymer photonic crystal slab waveguides were air-suspended as a membrane. The UV nanoimprinted polymer photonic crystal slab waveguides will be an attractive candidate for the implementations of ultra-compact photonic nano-systems and nano-photonic integrated circuits.
Application of UV nanoimprint lithography in polymer photonic nano-systems
We report an application of UV nanoimprint lithography for the fabrication of two-dimensional polymer photonic crystal slab waveguides. With the aid of optimized resin droplet size and imprint pressure, air-hole photonic crystal structures were replicated on the optical polymer resin. By incorporating buffered oxide etch process, the glass substrate was selectively etched and the imprinted polymer photonic crystal slab waveguides were air-suspended as a membrane. The UV nanoimprinted polymer photonic crystal slab waveguides will be an attractive candidate for the implementations of ultra-compact photonic nano-systems and nano-photonic integrated circuits.
Application of UV nanoimprint lithography in polymer photonic nano-systems
Choon-Gi Choi, (author) / Young-Tak Han, (author) / Jin Tae Kim, (author)
2006-10-01
421516 byte
Conference paper
Electronic Resource
English
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