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    Reactive Ion Etching in the Fabrication of Niobium Tunnel Junctions

    New search for: S. A. Reible

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    Reactive Ion Etching in the Fabrication of Niobium Tunnel Junctions

    New search for: S. A. Reible

    Access

    Access via TIB
    Check availability in my library

    Reactive Ion Etching in the Fabrication of Niobium Tunnel Junctions

    New search for: S. A. Reible

    Access

    Access via TIB
    Check availability in my library

    Access

    Access via TIB
    Check availability in my library

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Reactive Ion Etching in the Fabrication of Niobium Tunnel Junctions

    Contributors:

    S. A. Reible (author)

    Publication date:

    1980

    Size:

    5 pages

    Type of media:

    Report

    Type of material:

    No indication

    Language:

    English

    Keywords:

    Manufacturing Processes & Materials Handling , Semiconductor Devices , Niobium , Tunneling(Electronics) , Semiconductor junctions , Etching , Ions , Fabrication , Reprints , Ion etching

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