Electron beam lithography and reactive ion etching of nanometer size features in niobium films: Fid-Bau Portal

Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Piotrowski, T. T. / Piotrowska, A. / Kaminska, E. / Szopniewski, Z. / Kolesnik, S. / Wrobel, J. / Gier&lz.shtsls / owski, P. / Lewandowski, S.

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Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Piotrowski, T. T. / Piotrowska, A. / Kaminska, E. / Szopniewski, Z. / Kolesnik, S. / Wrobel, J. / Gier&lz.shtsls / owski, P. / Lewandowski, S.

Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Piotrowski, T. T. / Piotrowska, A. / Kaminska, E. / Szopniewski, Z. / Kolesnik, S. / Wrobel, J. / Gier&lz.shtsls / owski, P. / Lewandowski, S.

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Document information

Title:

Electron beam lithography and reactive ion etching of nanometer size features in niobium films

Contributors:

Piotrowski, T. T. (author) / Piotrowska, A. (author) / Kaminska, E. (author) / Szopniewski, Z. (author) / Kolesnik, S. (author) / Wrobel, J. (author) / Gier&lz.shtsls (author) / owski, P. (author) / Lewandowski, S. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -AMSTERDAM THEN LAUSANNE- C ; 15 ; 171-173

Publication date:

2001-01-01

Size:

3 pages

ISSN:

0928-4931

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.1 / 660

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Lammertink, R. G. / Hempenius, M. A. / van den Enk, J. E. et al. | British Library Online Contents | 2000