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Nanoscopic Study of Zirconia Films Grown by Atomic Layer Deposition
Abstract Atomic layer deposition (ALD) of ZrO2 thin films on single crystal silicon and sapphire substrates was studied. Atomic force microscopy, low-energy scanning photoelectron microscopy and high-energy electron diffraction methods were used for nanoscale characterisation of the films. It was revealed that the initial stage of growth depended significantly on the deposition temperature. At 600°C, the growth was very non-uniform during the first 50 ALD cycles, while at 300°C the films more evenly covered the substrates in the very beginning of deposition process. Non-uniform nucleation on silicon substrates at 600° C resulted in a significant increase of surface roughness even in relatively thick films at this temperature. No epitaxial growth was observed on silicon. On sapphire substrates, epitaxial ZrO2 films were obtained at 500-600°C.
Nanoscopic Study of Zirconia Films Grown by Atomic Layer Deposition
Abstract Atomic layer deposition (ALD) of ZrO2 thin films on single crystal silicon and sapphire substrates was studied. Atomic force microscopy, low-energy scanning photoelectron microscopy and high-energy electron diffraction methods were used for nanoscale characterisation of the films. It was revealed that the initial stage of growth depended significantly on the deposition temperature. At 600°C, the growth was very non-uniform during the first 50 ALD cycles, while at 300°C the films more evenly covered the substrates in the very beginning of deposition process. Non-uniform nucleation on silicon substrates at 600° C resulted in a significant increase of surface roughness even in relatively thick films at this temperature. No epitaxial growth was observed on silicon. On sapphire substrates, epitaxial ZrO2 films were obtained at 500-600°C.
Nanoscopic Study of Zirconia Films Grown by Atomic Layer Deposition
Sammelselg, V. (author) / Karlis, J. (author) / Kikas, A. (author) / Aarik, J. (author) / Mändar, H. (author) / Uustare, T. (author)
2002-01-01
9 pages
Article/Chapter (Book)
Electronic Resource
English
Atomic Force Microscopy , Silicon Substrate , Atomic Layer Deposition , Sapphire Substrate , RHEED Pattern Physics , Physics, general , Electronics and Microelectronics, Instrumentation , Surfaces and Interfaces, Thin Films , Characterization and Evaluation of Materials , Physical Chemistry , Condensed Matter Physics
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