Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Realization of Silicon Nanopillar Arrays with Controllable Sidewall Profiles by Holography Lithography and a Novel Single-Step Deep Reactive Ion Etching
Realization of Silicon Nanopillar Arrays with Controllable Sidewall Profiles by Holography Lithography and a Novel Single-Step Deep Reactive Ion Etching
Realization of Silicon Nanopillar Arrays with Controllable Sidewall Profiles by Holography Lithography and a Novel Single-Step Deep Reactive Ion Etching
Hung, Y.-J. (Autor:in) / Lee, S.-L. (Autor:in) / Thibeault, B.J. (Autor:in) / Coldren, L.A. (Autor:in) / Riel, Heike / Materials Research Society
MRS spring meeting; Low-dimensional functional nanostructures - fabrication, characterization and applications: symposium / ; 2010 ; San Francisco, CA
01.01.2010
14 pages
Includes bibliographical references and indexes.
Aufsatz (Konferenz)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Ion Energy Distributions and Sidewall Profiles in Reactive Ion Etching
British Library Online Contents | 1993
|British Library Online Contents | 2007
|Regular Alumina Nanopillar Arrays
British Library Online Contents | 2002
|Uniform trench arrays with controllable tilted profiles using metal-assisted chemical etching
British Library Online Contents | 2015
|British Library Online Contents | 2014
|