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Synchrotron-radiation-induced growth suppression and initiation in molecular-beam chemical vapor deposition of aluminum
Synchrotron-radiation-induced growth suppression and initiation in molecular-beam chemical vapor deposition of aluminum
Synchrotron-radiation-induced growth suppression and initiation in molecular-beam chemical vapor deposition of aluminum
Uesugi, F. (Autor:in) / Nishiyama, I. (Autor:in)
APPLIED SURFACE SCIENCE ; 60 ; 587
01.01.1992
587 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
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