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Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy
Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy
Photon energy dependence of synchrotron radiation induced growth suppression and initiation in Al chemical vapor deposition II. Surface analysis by Auger electron spectroscopy
Nishiyama, I. (Autor:in) / Uesugi, F. (Autor:in)
APPLIED SURFACE SCIENCE ; 103 ; 299-306
01.01.1996
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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