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On epitaxial Si~1~-~xGe~x thin film growth by chemical vapour deposition from a silane, germane, hydrogen chloride and hydrogen gas mixture
On epitaxial Si~1~-~xGe~x thin film growth by chemical vapour deposition from a silane, germane, hydrogen chloride and hydrogen gas mixture
On epitaxial Si~1~-~xGe~x thin film growth by chemical vapour deposition from a silane, germane, hydrogen chloride and hydrogen gas mixture
Kuehne, H. (Autor:in) / Morgenstern, T. (Autor:in) / Zaumseil, P. (Autor:in) / Krueger, D. (Autor:in)
01.01.1993
251 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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