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Interface properties of strained InGaAs/InP quantum wells grown by low pressure, metallo-organic vapour phase epitaxy
Interface properties of strained InGaAs/InP quantum wells grown by low pressure, metallo-organic vapour phase epitaxy
Interface properties of strained InGaAs/InP quantum wells grown by low pressure, metallo-organic vapour phase epitaxy
Schwedler, R. (Autor:in) / Gallmann, B. (Autor:in) / Wolter, K. (Autor:in) / Kohl, A. (Autor:in)
01.01.1993
66 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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