Using the metal-oxide-polysilicon-silicon (MOPS) structure to determine LPCVD polysilicon quality

Carter, J. C. / Evans, A. G. R. / Throngnumchai, K. | British Library Online Contents | 1993

Thermal-induced normal grain growth mechanism in LPCVD polysilicon film

Akhtar, J. / Lamichhane, S. K. / Sen, P. | British Library Online Contents | 2005

Thermal drift of piezoresistive properties of LPCVD polysilicon thin films between room temperature and 200C

Kleimann, P. / Semmache, B. / Le Berre, M. et al. | British Library Online Contents | 1997

Influence of substrate nature on the microstructure of LPCVD silicon films

Caussat, B. / Couderc, J. P. / Scheid, E. et al. | British Library Online Contents | 1998

Surface Morphology of 3C-SiC Heteroepitaxial Layers Grown by LPCVD on Si Substrates

Takahashi, T. / Ishida, Y. / Okumura, H. et al. | British Library Online Contents | 1998