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The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System
The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System
The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System
Jones, A. C. (Autor:in) / Auld, J. (Autor:in) / Rushworth, S. A. (Autor:in) / Williams, E. W. (Autor:in)
01.01.1994
229 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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