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The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System

Jones, A. C. / Auld, J. / Rushworth, S. A. / Williams, E. W.

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The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System

Jones, A. C. / Auld, J. / Rushworth, S. A. / Williams, E. W.

The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System

Jones, A. C. / Auld, J. / Rushworth, S. A. / Williams, E. W.

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Document information

Title:

The Deposition of Aluminum Nitride Thin Films by Metalorganic CVD-An Alternative Precursor System

Contributors:

Jones, A. C. (author) / Auld, J. (author) / Rushworth, S. A. (author) / Williams, E. W. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH- ; 229

Publication date:

1994-01-01

Size:

229 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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