Chemical Vapor Deposition of Copper for Multilevel Metallization

Kaloyeros, A. E. / Fury, M. A. | British Library Online Contents | 1993

A new metal-organic chemical vapor deposition process for selective copper metallization

Norman, J. A. T. / Muratore, B. A. / Dyer, P. N. et al. | British Library Online Contents | 1993

Chemical Vapor Deposition of Cr-Based Thin Films as Diffusion Barriers in Copper Metallization

Maury, F. / Gasqueres, C. / Duminica, F.-D. et al. | British Library Online Contents | 2003

Tantalum diffusion barrier grown by inorganic plasma-promoted chemical vapor deposition: Performance in copper metallization

Kaloyeros, A. E. / Chen, X. / Lane, S. et al. | British Library Online Contents | 2000

Precursor development for the chemical vapor deposition of aluminium, copper and palladium

Graefe, A. / Heinen, R. / Klein, F. et al. | British Library Online Contents | 1996