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Chemical Vapor Deposition of Copper for IC Metallization: Precursor Chemistry and Molecular Structure
Chemical Vapor Deposition of Copper for IC Metallization: Precursor Chemistry and Molecular Structure
Chemical Vapor Deposition of Copper for IC Metallization: Precursor Chemistry and Molecular Structure
Doppelt, P. (author) / Baum, T. H. (author)
MRS BULLETIN- MATERIALS RESEARCH SOCIETY ; 19 ; 41
1994-01-01
41 pages
Article (Journal)
Unknown
DDC:
620.11
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