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Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization
Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization
Bisethylacetoacetato Cu(II) as a novel metal-organic precursor for Cu film production by plasma-enhanced chemical vapor deposition toward ultra-large-scale integration metallization
Hwang, S. T. (Autor:in) / Shim, I. (Autor:in) / Lee, K. O. (Autor:in) / Kim, K. S. (Autor:in) / Kim, J. H. (Autor:in) / Choi, G. J. (Autor:in) / Cho, Y. S. (Autor:in) / Choi, H. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 11 ; 1051-1060
01.01.1996
10 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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