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Selective epitaxial Si based layers and TiSi~2 deposition by integrated chemical vapor deposition
Selective epitaxial Si based layers and TiSi~2 deposition by integrated chemical vapor deposition
Selective epitaxial Si based layers and TiSi~2 deposition by integrated chemical vapor deposition
Regolini, J. L. (Autor:in) / Margail, J. (Autor:in) / Bodnar, S. (Autor:in) / Maury, D. (Autor:in) / Morin, C. (Autor:in)
APPLIED SURFACE SCIENCE ; 99 ; 566-574
01.01.1996
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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