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Microwave plasma assisted LCVD growth and characterization of GaN
Microwave plasma assisted LCVD growth and characterization of GaN
Microwave plasma assisted LCVD growth and characterization of GaN
Zhou, B. (Autor:in) / Li, X. (Autor:in) / Tansley, T. L. (Autor:in) / Butcher, K. S. A. (Autor:in)
APPLIED SURFACE SCIENCE ; 99 ; 643-646
01.01.1996
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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Microwave plasma assisted LCVD growth and characterization of GaN
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