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Microwave plasma assisted LCVD growth and characterization of GaN

Zhou, B. / Li, X. / Tansley, T. L. / Butcher, K. S. A.

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Microwave plasma assisted LCVD growth and characterization of GaN

Zhou, B. / Li, X. / Tansley, T. L. / Butcher, K. S. A.

Microwave plasma assisted LCVD growth and characterization of GaN

Zhou, B. / Li, X. / Tansley, T. L. / Butcher, K. S. A.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Microwave plasma assisted LCVD growth and characterization of GaN

Contributors:

Zhou, B. (author) / Li, X. (author) / Tansley, T. L. (author) / Butcher, K. S. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 99 ; 643-646

Publication date:

1996-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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