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HRTEM characterization of the NiSi~2 growth into the Si(111) surface
HRTEM characterization of the NiSi~2 growth into the Si(111) surface
HRTEM characterization of the NiSi~2 growth into the Si(111) surface
Hietschold, M. (Autor:in) / Schulze, S. (Autor:in) / Falke, U. (Autor:in) / Fenske, F. (Autor:in) / Wolke, W. (Autor:in)
APPLIED SURFACE SCIENCE ; 102 ; 156-158
01.01.1996
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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