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HRTEM characterization of the NiSi~2 growth into the Si(111) surface

Hietschold, M. / Schulze, S. / Falke, U. / Fenske, F. / Wolke, W.

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HRTEM characterization of the NiSi~2 growth into the Si(111) surface

Hietschold, M. / Schulze, S. / Falke, U. / Fenske, F. / Wolke, W.

HRTEM characterization of the NiSi~2 growth into the Si(111) surface

Hietschold, M. / Schulze, S. / Falke, U. / Fenske, F. / Wolke, W.

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Check availability in my library

Order at Subito €

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Document information

Title:

HRTEM characterization of the NiSi~2 growth into the Si(111) surface

Contributors:

Hietschold, M. (author) / Schulze, S. (author) / Falke, U. (author) / Fenske, F. (author) / Wolke, W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 102 ; 156-158

Publication date:

1996-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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