Phase formations and electrical properties of doped-PZT/PbTiO~3 films deposited by reactive sputtering using multi-targets: Fid-Bau Portal

Phase formations and electrical properties of doped-PZT/PbTiO~3 films deposited by reactive sputtering using multi-targets

Choi, G.-P. / Ahn, J.-H. / Lee, W.-J. / Sung, T.-H. / Kim, H.-G.

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Phase formations and electrical properties of doped-PZT/PbTiO~3 films deposited by reactive sputtering using multi-targets

Choi, G.-P. / Ahn, J.-H. / Lee, W.-J. / Sung, T.-H. / Kim, H.-G.

Phase formations and electrical properties of doped-PZT/PbTiO~3 films deposited by reactive sputtering using multi-targets

Choi, G.-P. / Ahn, J.-H. / Lee, W.-J. / Sung, T.-H. / Kim, H.-G.

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Titel:

Phase formations and electrical properties of doped-PZT/PbTiO~3 films deposited by reactive sputtering using multi-targets

Beteiligte:

Choi, G.-P. (Autor:in) / Ahn, J.-H. (Autor:in) / Lee, W.-J. (Autor:in) / Sung, T.-H. (Autor:in) / Kim, H.-G. (Autor:in) / Itoh, M. / Kawazoe, H. / Yamauchi, H. / Koinuma, H.

Erschienen in:

Oxide Electronics ; 16-22

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 41

Erscheinungsdatum:

01.01.1996

Format / Umfang:

7 pages

ISSN:

0921-5107

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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