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Characterization of nitrided SiO~2 thin films using secondary ion mass spectrometry
Characterization of nitrided SiO~2 thin films using secondary ion mass spectrometry
Characterization of nitrided SiO~2 thin films using secondary ion mass spectrometry
Frost, M. R. (Autor:in) / Magee, C. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 104/105 ; 379-384
01.01.1996
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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