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Organo-germanium adsorption on a silicon surface by excimer-light irradiation
Organo-germanium adsorption on a silicon surface by excimer-light irradiation
Organo-germanium adsorption on a silicon surface by excimer-light irradiation
Ohshima, H. (Autor:in)
APPLIED SURFACE SCIENCE ; 107 ; 85-89
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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