Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Wear phenomena in chemical mechanical polishing
Wear phenomena in chemical mechanical polishing
Wear phenomena in chemical mechanical polishing
Liang, H. (Autor:in) / Kaufman, F. (Autor:in) / Sevilla, R. (Autor:in) / Anjur, S. (Autor:in)
WEAR -LAUSANNE- ; 211 ; 271-279
01.01.1997
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11292
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Modeling of Polishing Pad Wear in Chemical Mechanical Polishing
British Library Online Contents | 2010
|Chemically enhanced synergistic wear: A copper chemical mechanical polishing case study
British Library Online Contents | 2013
|A micro-contact and wear model for chemical-mechanical polishing of silicon wafers
British Library Online Contents | 2002
|Mechanism of Ge2Sb2Te5 chemical mechanical polishing
British Library Online Contents | 2012
|